Post-oxidation sputtering device
It is an optimal post-oxidation sputtering device for multilayer optical thin films.
Features ■ Achieves high productivity by adopting a post-oxidation method ■ Realizes excellent film thickness uniformity of ±1% or less ■ Allows for full-area sputtering through horizontal substrate transport
- Company：芝浦メカトロニクス
- Price：Other
